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            HMDS pretreatment system, HMDS oven

            HMDS pretreatment system, HMDS oven reducing the contact angle of the silicon wafer after HMDS treatment The amount of photoresist to improve the adhesion of photoresist and silicon.

            • 產(chǎn)品型號(hào):
            • 廠商性質(zhì):生產(chǎn)廠家
            • 更新時(shí)間:2025-09-16
            • 訪  問(wèn)  量:2139
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            產(chǎn)品詳情

             HMDS Pretreatment System, HMDS Oven Importance:
            In the semiconductor production process, lithography is an important part of the integrated circuit graphics transfer process, the quality of glue directly affect the quality of lithography, coating process is also particularly important. Most of the photoresist in the photoresist process is hydrophobic, and the hydroxyl and residual water molecules on the surface of the wafer are hydrophilic, which results in poor adhesion of the photoresist and the silicon wafer, When developing, the developer intrudes into the connection between the photoresist and the silicon wafer, which is liable to cause the failure of the photographic pattern transfer, and the lateral corrosion is liable to occur. The thickener HMDS (hexamethyldisilazane) can well improve this condition. HMDS will be applied to the semiconductor manufacturing silicon, gallium arsenide, lithium niobate, glass, sapphire, wafer and other materials, the surface of the reaction by the oven to generate the silicone-based compounds. It succeeds in turning the surface of the wafer from hydrophobic to hydrophobic, and its hydrophobic base is well combined with the photoresist and acts as a coupling agent.
            HMDS pretreatment system, HMDS oven Role:

            The HMDS pretreatment system can uniformly coat a layer of HMDS on the surface of the wafer and substrate by reducing the working temperature, processing time and processing time of the oven pretreatment process, reducing the contact angle of the silicon wafer after HMDS treatment The amount of photoresist to improve the adhesion of photoresist and silicon.
            HMDS pretreatment system, HMDS oven Characteristics:
            1, Pre-processing performance better
            2, The treatment is more uniform
            3, High efficiency
            4, More savings liquid
            5, More environmentally friendly and safe
            6, Low-pressure alarm device
            7, Can automatically draw HMDS function
            8, Can automatically add HMDS function
            9, HMDS liquid leakage alarm function
            10, HMDS emergency evacuation function
            11, Data record printing function
             

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